DIN EN 15991:2016
Testing of ceramic and basic materials - Direct determination of mass fractions of impurities in powders and granules of silicon carbide by inductively coupled plasma optical emission spectrometry (ICP OES) with electrothermal vaporisation (ETV); German v

Standard No.
DIN EN 15991:2016
Release Date
2016
Published By
German Institute for Standardization
Status
Replace By
DIN EN 15991:2016-02
Latest
DIN EN 15991:2016-02
Replace
DIN EN 15991:2011 DIN EN 15991:2014

DIN EN 15991:2016 Referenced Document

  • DIN ISO 5725-2:2002 Accuracy (trueness and precision) of measurement methods and results - Part 2: Basic method for the determination of repeatability and reproducibility of a standard measurement method (ISO 5725-2:1994 including Technical Corrigendum 1:2002)
  • DIN ISO 5725-4:2003 Accuracy (trueness and precision) of measurement methods and results - Part 4: Basic methods for the determination of the trueness of a standard measurement method (ISO 5725-4:1994)
  • EN ISO 21068-1:2008 Chemical analysis of silicon-carbide-containing raw materials and refractory products - Part 1: General information and sample preparation (ISO 21068-1:2008)
  • ISO 5022:1979 Shaped refractory products; Sampling and acceptance testing
  • ISO 5725-2:1994 Accuracy (trueness and precision) of measurement methods and results - Part 2: Basic method for the determination of repeatability and reproducibility of a standard measurement method
  • ISO 5725-4:1994 Accuracy (trueness and precision) of measurement methods and results - Part 4: Basic methods for the determination of the trueness of a standard measurement method
  • ISO 8656-1:1988 Refractory products; sampling of raw materials and unshaped products; part 1: sampling scheme
  • ISO/IEC Guide 98-3:2008 Uncertainty of measurement — Part 3: Guide to the expression of uncertainty in measurement (GUM:1995)

DIN EN 15991:2016 history

  • 2016 DIN EN 15991:2016-02 Testing of ceramic and basic materials - Direct determination of mass fractions of impurities in powders and granules of silicon carbide by inductively coupled plasma optical emission spectrometry (ICP OES) with electrothermal vaporisation (ETV); Germa...
  • 2016 DIN EN 15991:2016 Testing of ceramic and basic materials - Direct determination of mass fractions of impurities in powders and granules of silicon carbide by inductively coupled plasma optical emission spectrometry (ICP OES) with electrothermal vaporisation (ETV); German v
  • 2011 DIN EN 15991:2011 Testing of ceramic and basic materials - Direct determination of mass fractions of impurities in powders and granules of silicon carbide by inductively coupled plasma optical emission spectrometry (ICP OES) with electrothermal vaporisation (ETV); German v
  • 2008 DIN 51096:2008 Testing of ceramic raw and basic materials - Direct determination of mass fractions of impurities in powders and granules of silicon carbide by inductively coupled plasma optical emission spectrometry (ICP OES) and electrothermal vaporisation (ETV)
Testing of ceramic and basic materials - Direct determination of mass fractions of impurities in powders and granules of silicon carbide by inductively coupled plasma optical emission spectrometry (ICP OES) with electrothermal vaporisation (ETV); German v



Copyright ©2023 All Rights Reserved