DIN 51096:2008
Testing of ceramic raw and basic materials - Direct determination of mass fractions of impurities in powders and granules of silicon carbide by inductively coupled plasma optical emission spectrometry (ICP OES) and electrothermal vaporisation (ETV)
- Standard No.
- DIN 51096:2008
- Release Date
- 2008
- Published By
- German Institute for Standardization
- Status
- Replace By
- DIN EN 15991:2011
- Latest
- DIN EN 15991:2016
DIN 51096:2008 history
- 2016 DIN EN 15991:2016 Testing of ceramic and basic materials - Direct determination of mass fractions of impurities in powders and granules of silicon carbide by inductively coupled plasma optical emission spectrometry (ICP OES) with electrothermal vaporisation (ETV); German v
- 2011 DIN EN 15991:2011 Testing of ceramic and basic materials - Direct determination of mass fractions of impurities in powders and granules of silicon carbide by inductively coupled plasma optical emission spectrometry (ICP OES) with electrothermal vaporisation (ETV); German v
- 2008 DIN 51096:2008 Testing of ceramic raw and basic materials - Direct determination of mass fractions of impurities in powders and granules of silicon carbide by inductively coupled plasma optical emission spectrometry (ICP OES) and electrothermal vaporisation (ETV)
