General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China
Latest
GB/T 32189-2015
Scope
This standard specifies the method for testing the surface roughness of the chemically long-term single crystal substrate by atomic force microscope. This standard applies to nitrided homogeneous substrates grown by chemical vapor deposition and other methods with a surface roughness less than 10 nm. Other semiconductor single product substrates with similar surface structure shall be tested by the methods provided in this standard, and both sides of the test shall reach an agreement through negotiation.
GB/T 32189-2015 Referenced Document
GB/T 14264 Semiconductor materials-Terms and definitions
GB/T 27760 Test method for calibrating the z-magnification of an atomic force microscope at subnanometer displacement levels using Si(111) monatomic steps