GB/T 32189-2015
Atomic Force Microscopy Examination of Surface Roughness of Gallium Nitride Single Crystal Substrate (English Version)

Standard No.
GB/T 32189-2015
Language
Chinese, Available in English version
Release Date
2016
Published By
General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China
Latest
GB/T 32189-2015
Scope
This standard specifies the method for testing the surface roughness of the chemically long-term single crystal substrate by atomic force microscope. This standard applies to nitrided homogeneous substrates grown by chemical vapor deposition and other methods with a surface roughness less than 10 nm. Other semiconductor single product substrates with similar surface structure shall be tested by the methods provided in this standard, and both sides of the test shall reach an agreement through negotiation.

GB/T 32189-2015 Referenced Document

  • GB/T 14264 Semiconductor materials-Terms and definitions
  • GB/T 27760 Test method for calibrating the z-magnification of an atomic force microscope at subnanometer displacement levels using Si(111) monatomic steps
  • GB/T 3505 Geometrical Product Specifications(GPS).Surface texture:Profile method.Terms,definitions and surface texture parameters
  • JJF 1351 Calibration Specification for Scanning Probe Microscopes

GB/T 32189-2015 history

  • 2016 GB/T 32189-2015 Atomic Force Microscopy Examination of Surface Roughness of Gallium Nitride Single Crystal Substrate
Atomic Force Microscopy Examination of Surface Roughness of Gallium Nitride Single Crystal Substrate



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