This standard uses infrared spectroscopy to determine the radial variation of interstitial oxygen content in silicon crystals. This standard requires the use of anaerobic reference samples and a set of certified standards for calibrating equipment. This standard applies to the measurement of interstitial oxygen content in n-type silicon single crystals with room temperature resistivity greater than 0.1Ω•cm and p-type silicon single crystals with room temperature resistivity greater than 0.5Ω•cm. The effective range of this standard for measuring oxygen content is from 1×10 at·cm to the maximum solid solubility of interstitial oxygen in silicon crystals.
GB/T 14144-2009 Referenced Document
GB/T 14264-2009 Semiconductor materials-Terms and definitions
GB/T 1557-2006 The method of determining interstitial oxygen content in silicon by infrared absorption
GB/T 14144-2009 history
2009GB/T 14144-2009 Testing method for determination of radial interstitial oxygen variation in silicon
1993GB/T 14144-1993 Test method for determination of radial interstitial oxygen variation in silicon