JIS K 0160:2009
Surface chemical analysis -- Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy

Standard No.

JIS K 0160:2009

Release Date

2009

Published By

Japanese Industrial Standards Committee (JISC)

Latest

JIS K 0160:2009

JIS K 0160:2009 Referenced Document

• JIS B 9920 Classification of air cleanliness for cleanrooms
• JIS K 0148 Surface chemical analysis -- Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
• JIS Z 8402-2 Accuracy (trueness and precision) of measurement methods and results -- Part 2: Basic method for the determination of repeatability and reproducibility of a standard measurement method

JIS K 0160:2009 history

• 2009 JIS K 0160:2009 Surface chemical analysis -- Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy