This standard applies to the inspection of polycrystalline silicon rod-based phosphorus deposited on silicon cores. The effective range of this standard to detect impurity concentration: 0.002×10~100×10.
GB/T 4059-2007 Referenced Document
GB/T 13389 Practice for conversion between resistivity and dopant density for boron-doped, phosphorus-doped, and arsenic-doped silicon*, 2014-12-31 Update
GB/T 14264 Semiconductor materials-Terms and definitions *, 2009-10-30 Update
GB/T 1551 Test method for measuring resistivity of monocrystal silicon—In-line four-point probe and direct current two-point probe method*, 2021-05-21 Update
GB/T 1553 Determination of Minority Carrier Lifetime in Silicon and Germanium by Photoconductivity Decay Method*, 2023-08-06 Update
GB/T 1554 Testing method for crystallographic perfection of silicon by preferential etch techniques*, 2009-10-30 Update
GB/T 1555 Method for Determination of Crystalline Orientation of Semiconductor Single Crystal*, 2023-08-06 Update
GB/T 4059-2007 history
2018GB/T 4059-2018 Test method for phosphorus content in polycrystalline silicon by zone-melting method under controlled atmosphere
2007GB/T 4059-2007 Polycrystalline silicon.Examination method.Zone-melting on Phosphorus under controlled atmosphere
1983GB/T 4059-1983 Polycrystalline silicon--Examination method--Zone-melting on phosphorus under controlled atmosphere