GB/T 14849.4-2014
Methods for chemical analysis of silicon metal.Part 4:Determination of impurity contents.Inductively coupled plasma atomic emission spectrometric method (English Version)

Standard No.: GB/T 14849.4-2014
Language: Chinese, Available in English version
Release Date: 2014
Published By: General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China
Latest: GB/T 14849.4-2014
Replace: GB/T 14849.4-2008

Scope: This part of GB/T 14849 specifies the methods for the determination of iron, aluminum, calcium, manganese, titanium, nickel, copper, chromium, vanadium, magnesium, cobalt, phosphorus, potassium, sodium, lead, zinc and boron in industrial silicon. This part is applicable to the determination of iron, aluminum, calcium, manganese, titanium, nickel, copper, chromium, vanadium, magnesium, cobalt, phosphorus, potassium, sodium, lead, zinc and boron in industrial silicon. The determination range of each element is shown in Table 1.

GB/T 14849.4-2014 Referenced Document

GB/T 6682 Water for analytical laboratory use.Specification and test methods
GB/T 8170 Rules of rounding off for numerical values & expression and judgement of limiting values

2014 GB/T 14849.4-2014 Methods for chemical analysis of silicon metal.Part 4:Determination of impurity contents.Inductively coupled plasma atomic emission spectrometric method
2008 GB/T 14849.4-2008 Methods for chemical analysis of silicon metal.Part 4: Determination of elements content.Inductively coupled plasma atomic emission specrometric method