GB/T 14849.4-2008 Methods for chemical analysis of silicon metal.Part 4: Determination of elements content.Inductively coupled plasma atomic emission specrometric method (English Version)
This part specifies the determination method of iron, aluminum, calcium, titanium manganese and nickel content in industrial silicon. This part is applicable to the determination of iron, aluminum, calcium, titanium manganese and nickel content in industrial silicon. The determination range is shown in Table 1.
GB/T 14849.4-2008 history
2014GB/T 14849.4-2014 Methods for chemical analysis of silicon metal.Part 4:Determination of impurity contents.Inductively coupled plasma atomic emission spectrometric method
2008GB/T 14849.4-2008 Methods for chemical analysis of silicon metal.Part 4: Determination of elements content.Inductively coupled plasma atomic emission specrometric method