General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China
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GB/T 31227-2014
Scope
This standard specifies a method for measuring surface roughness using an atomic force microscope (AFM). This standard is applicable to the measurement of thin films produced by sputtering film formation method with an average roughness Ra of less than 100 nm. The measurement of surface roughness of other non-sputtered films can refer to this method.
GB/T 31227-2014 Referenced Document
GB/T 27760-2011 Test method for calibrating the z-magnification of an atomic force microscope at subnanometer displacement levels using Si(111) monatomic steps
GB/T 31227-2014 history
2014GB/T 31227-2014 Test method for the surface roughness by atomic force microscope for sputtered thin films