KS C 6520-2008
Components and materials of semiconductor process－Measurement of wear characteristics by plasma

Standard No.

KS C 6520-2008

Release Date

2008

Published By

Korean Agency for Technology and Standards (KATS)

Status

Be replaced

Replace By

KS C 6520-2019

Latest

KS C 6520-2021

Scope

This standard applies to parts inside plasma etching or deposition process equipment and is exposed to plasma.

KS C 6520-2008 history

• 2021 KS C 6520-2021 Components and materials of semiconductor process —Measurement of wear characteristics by plasma
• 2019 KS C 6520-2019 Components and materials of semiconductor process —Measurement of wear characteristics by plasma
• 2008 KS C 6520-2008 Components and materials of semiconductor process－Measurement of wear characteristics by plasma