GOST R 8.700-2010 State system for ensuring the uniformity of measurements. Method of surface roughness effective height measurements by means of scanning probe atomic force microscope
GOST R 8.628-2007 State system for ensuring the uniformity of measurements. Single-crystal silicon nanometer range relief measures. Requirements for geometrical shapes, linear sizes and manufacturing material selection
GOST R 8.629-2007 State system for ensuring the uniformity of measurements. Nanometer range relief measures with trapezoidal profile of elements. Methods for verification
GOST R 8.630-2007 State system for ensuring the uniformity of measurements. Atomic-force scanning probe microscopes. Methods for verification
GOST R 8.635-2007 State system for ensuring the uniformity of measurements. Atomic-force scanning probe microscopes. Method for calibration
GOST R 8.644-2008 State system for ensuring the uniformity of measurements. Nanometer range relief measures with trapezoidal profile of elements. Methods for calibration
GOST R ISO 14644-2-2001 Cleanrooms and associated controlled environments. Part 2. Specifications for testing and monitoring to prove continued compliance with ISO 14644-1
GOST R ISO 14644-5-2005 Cleanrooms and associated controlled environments. Part 5. Operations
GOST R 8.700-2010 history
2010GOST R 8.700-2010 State system for ensuring the uniformity of measurements. Method of surface roughness effective height measurements by means of scanning probe atomic force microscope