ISO 14237:2010
Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

Standard No.

ISO 14237:2010

Release Date

2010

Published By

International Organization for Standardization (ISO)

Latest

ISO 14237:2010

Scope

This International Standard specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 × 1016 atoms/cm3 to 1 × 1020 atoms/cm3.

ISO 14237:2010 Referenced Document

• ISO 17560 Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of boron in silicon*， 2014-09-10 Update
• ISO 18114 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials*， 2021-04-30 Update

ISO 14237:2010 history

• 2010 ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
• 2000 ISO 14237:2000 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials