ISO 14237:2000
Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

Standard No.

ISO 14237:2000

Release Date

2000

Published By

International Organization for Standardization (ISO)

Status

Withdraw

Replace By

ISO 14237:2010

Latest

ISO 14237:2010

Scope

This International Standard specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 × 10 atoms/cm to 1 × 10 atoms/cm.

ISO 14237:2000 history

• 2010 ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
• 2000 ISO 14237:2000 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials