JIS K 0164:2010
Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon

Standard No.

JIS K 0164:2010

Release Date

2010

Published By

Japanese Industrial Standards Committee (JISC)

Status

Be replaced 2023-02

Replace By

JIS K 0164:2023

Latest

JIS K 0164:2023

JIS K 0164:2010 Referenced Document

• JIS K 0143:2000 Surface chemical analysis -- Secondary ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials

JIS K 0164:2010 history

• 2023 JIS K 0164:2023 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
• 2010 JIS K 0164:2010 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon