JIS K 0143:2000
Surface chemical analysis -- Secondary ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials

Standard No.

JIS K 0143:2000

Release Date

2000

Published By

Japanese Industrial Standards Committee (JISC)

Status

Be replaced 2023-02

Replace By

JIS K 0143:2023

Latest

JIS K 0143:2023

Scope

This standard specifies a secondary ion mass spectrometry method for determining the atomic concentration of boron in single-crystal silicon using a uniformly doped sample calibrated with a certified standard sample prepared by implanting boron. This method is used to determine the concentration of uniformly added boron in the concentration range from 1 x 10 atoms/cm to 1 x 10 atoms/cm.

JIS K 0143:2000 history

• 2023 JIS K 0143:2023 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials
• 2000 JIS K 0143:2000 Surface chemical analysis -- Secondary ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials