GB/T 24582-2009 Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-inductively coupled plasma mass spectrometry (English Version)
This standard specifies the analysis method for leaching metal impurities from the surface of polycrystalline silicon block with acid, and quantitatively detecting the trace amount of metal impurities on the surface of polycrystalline silicon with inductively coupled plasma mass spectrometer. This standard applies to the detection of alkali metals, alkaline earth metals and the first series of transition elements such as sodium, potassium, calcium, iron, nickel, copper, zinc and other elements such as aluminum. This standard applies to the detection of metal contaminants on the surface of various rods, blocks, grains, and flakes. Due to the irregular shape of blocks, flakes or granules, it is difficult to accurately measure the area. Therefore, according to the calculation results of the sample weight, the sample weight used is 50 g to 300 g, and the detection limit is 0.01 ng/mL. The concentration, composition, temperature and leaching time of the acid determine the depth of surface corrosion and the leaching benefit of surface contaminants. Less than 1% of the sample weight was etched away in this experimental method. This standard applies to the determination of samples with a weight of 25 g to 5000 g. In order to achieve the purpose of arbitration, this test method stipulates that the weight of the sample is about 300 g.
GB/T 24582-2009 Referenced Document
ASTM D5127 Standard Guide for Ultra Pure Water Used in the Electronics and Semiconductor Industry
ISO 14644-1 Cleanrooms and associated controlled environments - Part 1: Classification of air cleanliness by particle concentration (includes Redline Version)*, 2015-02-01 Update
SEMI C30 SPECIFICATIONS FOR HYDROGEN PEROXIDE*, 2010-08-27 Update
GB/T 24582-2009 history
2023GB/T 24582-2023 Determination of metal impurity content on polysilicon surface by acid leaching-inductively coupled plasma mass spectrometry
2009GB/T 24582-2009 Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-inductively coupled plasma mass spectrometry