ASTM E2245-02
Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer

Standard No.

ASTM E2245-02

Release Date

2002

Published By

American Society for Testing and Materials (ASTM)

Status

Be replaced

Replace By

ASTM E2245-05

Latest

ASTM E2245-11(2018)

Scope

1.1 This test method covers a procedure for measuring the compressive residual strain in thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an interferometer. Measurements from fixed-fixed beams that are touching the underlying layer are not accepted.

1.2 This test method uses a non-contact optical interferometer with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.

1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

ASTM E2245-02 history

• 2018 ASTM E2245-11(2018) Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer
• 2011 ASTM E2245-11e1 Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer
• 2011 ASTM E2245-11 Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer
• 2005 ASTM E2245-05 Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer
• 2002 ASTM E2245-02 Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer