GB/T 15909-1995
Gas for electronic industry--Silane (English Version)
- Standard No.
- GB/T 15909-1995
- Language
- Chinese, Available in English version
- Release Date
- 1995
- Published By
- General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China
- Status
- 2010-05
- Replace By
- GB/T 15909-2009
- Latest
- GB/T 15909-2017
- Scope
- This standard specifies the technical requirements, inspection methods, inspection rules, packaging, marking, transportation, storage and safety requirements for silane gas used in the electronics industry. This standard is mainly used in the electronics industry for epitaxial deposition of polysilicon and single crystal silicon, low-temperature chemical vapor deposition of silicon dioxide, deposition of amorphous silicon films, etc. Molecular formula: SiH4 Relative molecular mass: 32.117 (according to the international relative atomic mass in 1991). Boiling point at 101.3kPa: -112°C Gas density at 20°C and 101.3kPa: 1.342kg/m3. Liquid density at -185°C: 711kg/m3.
GB/T 15909-1995 history
- 2017 GB/T 15909-2017 Gas for electronic industry—Silane
- 2009 GB/T 15909-2009 Gas for electronic industry-Silane
- 1995 GB/T 15909-1995 Gas for electronic industry--Silane
