GB/T 6621-1995
Test methods for surface flatness of silicon polished slices (English Version)

Standard No.

GB/T 6621-1995

Language

Chinese, Available in English version

Release Date

1995

Published By

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China

Status

Be replaced 2010-06

Replace By

GB/T 6621-2009

Latest

GB/T 6621-2009

Scope

This standard specifies the method for measuring the surface roughness of silicon polished wafers by the interference phenomenon of coherent light. This standard is suitable for testing the surface flatness of polished silicon wafers, and also for testing the surface flatness of silicon epitaxial wafers and mirror-like semiconductor wafers.

GB/T 6621-1995 history

• 2009 GB/T 6621-2009 Testing methods for surface flatness of silicon slices
• 1995 GB/T 6621-1995 Test methods for surface flatness of silicon polished slices