GB/T 4058-1995
Test method for detection of oxidation induced defects in polished silicon wafers (English Version)

Standard No.

GB/T 4058-1995

Language

Chinese, Available in English version

Release Date

1995

Published By

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China

Status

Be replaced 2010-06

Replace By

GB/T 4058-2009

Latest

GB/T 4058-2009

Scope

This standard specifies the inspection method for oxidation-induced defects on silicon polished wafers. This standard applies to the detection of crystal defects induced or enhanced in the surface area of silicon polished wafers during the oxidation process of simulated devices.

GB/T 4058-1995 history

• 2009 GB/T 4058-2009 Test method for detection of oxidation induced defects in polished silicon wafers
• 1995 GB/T 4058-1995 Test method for detection of oxidation induced defects in polished silicon wafers