This document describes a method for the determination of group III and V impurities in silicon single crystals by low temperature Fourier transform infrared spectroscopy. This document is applicable to the content of III and V group impurities aluminum (Al), antimony (Sb), arsenic (As), boron (B), gallium (Ga), indium (In) and phosphorus (P) in silicon single crystal Determination, the determination range of each element (in atomic number) is 1.0×1010cm-3 ~4.1×1014cm-3.
GB/T 24581-2022 Referenced Document
GB/T 14264 Semiconductor materials-Terms and definitions
GB/T 29057 Practice for evaluating polycrystalline silicon rods by zone fusion pulling and spectroscopic analysis*, 2023-08-06 Update