SJ/T 11498-2015
Test method for measuring oxygen contamination in heavily doped silicon substrates by secondary ion mass spectrometry (English Version)

Standard No.
SJ/T 11498-2015
Language
Chinese, Available in English version
Release Date
2015
Published By
Professional Standard - Electron
Latest
SJ/T 11498-2015

SJ/T 11498-2015 history

  • 2015 SJ/T 11498-2015 Test method for measuring oxygen contamination in heavily doped silicon substrates by secondary ion mass spectrometry
Test method for measuring oxygen contamination in heavily doped silicon substrates by secondary ion mass spectrometry



Copyright ©2023 All Rights Reserved