GB/T 31225-2014
Test method for the thickness of silicon oxide on Si substrate by ellipsometer (English Version)
- Standard No.
- GB/T 31225-2014
- Language
- Chinese, Available in English version
- Release Date
- 2014
- Published By
- General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China
- Latest
- GB/T 31225-2014
- Scope
- This standard provides a method for measuring the thickness of a thin silicon dioxide layer on a silicon surface using a spectral ellipsometer with continuously variable wavelength and variable angle. This standard is suitable for testing the thickness of silicon dioxide thin layer with uniform thickness, isotropy, 10nm~1000nm thick on the silicon substrate. Other single-layer dielectric film samples on the substrate that are opaque at the test wavelength can be measured. Refer to this method.
GB/T 31225-2014 Referenced Document
- JJF 1059.1-2012 Evaluation and Expression of Uncertainty in Measurement
GB/T 31225-2014 history
- 2014 GB/T 31225-2014 Test method for the thickness of silicon oxide on Si substrate by ellipsometer
