JIS C 5630-12:2014
Semiconductor devices.Micro-electromechanical devices.Part 12: Bending fatigue testing method of thin film materials using resonant vibration of MEMS structures

Standard No.
JIS C 5630-12:2014
Release Date
2014
Published By
Japanese Industrial Standards Committee (JISC)
Latest
JIS C 5630-12:2014

JIS C 5630-12:2014 Referenced Document

  • ISO 12107 Metallic materials - Fatigue testing - Statistical planning and analysis of data
  • JIS C 5630-3 Semiconductor devices -- Micro-electromechanical devices-- Part 3: Thin film standard test piece for tensile testing

JIS C 5630-12:2014 history

  • 2014 JIS C 5630-12:2014 Semiconductor devices.Micro-electromechanical devices.Part 12: Bending fatigue testing method of thin film materials using resonant vibration of MEMS structures
Semiconductor devices.Micro-electromechanical devices.Part 12: Bending fatigue testing method of thin film materials using resonant vibration of MEMS structures



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