KS D 0258-2012
Test methods of crystalline defects in silicon by preferential etch techniques

Standard No.

KS D 0258-2012

Release Date

2012

Published By

Korean Agency for Technology and Standards (KATS)

Status

Be replaced

Replace By

KS D 0258-2012(2017)

Latest

KS D 0258-2022

Replace

KS D 0258-2002

Scope

This standard detects crystal defects in silicon wafers by selective etchants that do not contain hexavalent chromium.

KS D 0258-2012 history

• 2022 KS D 0258-2022 Test methods of crystalline defects in silicon by preferential etch techniques
• 0000 KS D 0258-2012(2017)
• 2012 KS D 0258-2012 Test methods of crystalline defects in silicon by preferential etch techniques
• 0000 KS D 0258-2002