GB/T 29505-2013 (English Version) PDF

Standard No.: GB/T 29505-2013
Language: Chinese, Available in English version
Release Date: 2013
Published By: General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China
Latest: GB/T 29505-2013

Scope: This standard provides the measurement principle, measurement equipment and procedures of the three methods commonly used in the measurement of the surface roughness of silicon wafers: profilometer, interferometer and scatterometer, and specifies the standard scanning position pattern and roughness of the local or entire area of the silicon wafer surface. Abbreviation definition. This standard applies to the roughness measurement of the surface of the flat silicon wafer; it can also be used for other types of flat wafer materials, but it is not applicable to the roughness measurement of the wafer edge area. This standard does not apply to measuring instruments with bandwidth spatial wavelength ≤ 10 nm.

GB/T 29505-2013 Referenced Document

2013 GB/T 29505-2013 Test method for measuring surface roughness on planar surfaces of silicon wafer