GB/T 29056-2012
Trichlorosilane for silicon epitaxy.Determination of boron,aluminium,phosphorus,vanadium,chrome,manganese,iron,cobalt,nickel,copper,arsenic,molybdenum and antimony content.Inductively coupled plasma mass spectrometric method (English Version)
- Standard No.
- GB/T 29056-2012
- Language
- Chinese, Available in English version
- Release Date
- 2012
- Published By
- General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China
- Latest
- GB/T 29056-2012
- Scope
- Personnel using this standard should have practical experience in formal laboratory work. This standard does not address all possible safety issues. It is the user's responsibility to take appropriate safety and health measures and ensure compliance with the conditions stipulated in the relevant national laws and regulations. This standard specifies the determination of boron, aluminum, phosphorus, vanadium, chromium, manganese, iron, cobalt, Methods for the content of trace elements such as nickel, copper, molybdenum, arsenic, antimony, etc. This standard applies to the determination of boron, aluminum, phosphorus, vanadium, chromium, manganese, iron, cobalt, nickel, copper, molybdenum, arsenic, antimony, etc. in trichlorosilane (SiHCl3) for silicon epitaxy. The determination range of each element is shown in Table 1. Table 1 (omitted)
GB/T 29056-2012 history
- 2012 GB/T 29056-2012 Trichlorosilane for silicon epitaxy.Determination of boron,aluminium,phosphorus,vanadium,chrome,manganese,iron,cobalt,nickel,copper,arsenic,molybdenum and antimony content.Inductively coupled plasma mass spectrometric method
