IEC 62047-8:2011
Semiconductor devices - Micro-electromechanical devices - Part 8: Strip bending test method for tensile property measurement of thin films

Standard No.
IEC 62047-8:2011
Release Date
2011
Published By
International Electrotechnical Commission (IEC)
Latest
IEC 62047-8:2011
Replace
IEC 47F/71/FDIS:2010
Scope
This international standard specifies the strip bending test method to measure tensile properties of thin films with high accuracy@ repeatability@ moderate effort of alignment and handling compared to the conventional tensile test. This testing method is valid for test pieces with a thickness between 50 nm and several mm@ and with an aspect ratio (ratio of length to thickness) of more than 300. The hanging strip (or bridge) between two fixed supports are widely adopted in MEMS or micro-machines. It is much easier to fabricate these strips than the conventional tensile test pieces. The test procedures are so simple to be readily automated. This international standard can be utilized as a quality control test for MEMS production since its testing throughput is very high compared to the conventional tensile test.

IEC 62047-8:2011 history

  • 2011 IEC 62047-8:2011 Semiconductor devices - Micro-electromechanical devices - Part 8: Strip bending test method for tensile property measurement of thin films
Semiconductor devices - Micro-electromechanical devices - Part 8: Strip bending test method for tensile property measurement of thin films



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