GB/T 24575-2009
Test method for measuring surface sodium, aluminum, potassium, and iron on silicon and epi substrates by secondary ion mass spectrometry (English Version)

Standard No.

GB/T 24575-2009

Language

Chinese, Available in English version

Release Date

2009

Published By

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China

Latest

GB/T 24575-2009

Scope

1.1 This standard specifies the secondary ion mass spectrometry detection method for Na, Al, K and Fe on the surface of silicon and epitaxial wafers. This standard applies to the detection of Na, Al, K and Fe on the surface of mirror-polished single crystal silicon wafers and epitaxial wafers by secondary ion mass spectrometry (SIMS). This standard tests the total amount of each metal, so the method is independent of the chemical and electrical properties of the individual metals. 1.2 This standard applies to silicon wafers of all doping types and doping concentrations. 1.3 This standard is especially applicable to the test of surface metal contamination within a depth of about 5 nm on the wafer surface. 1.4 This standard is applicable to the testing of Na, Al, K and Fe whose surface density ranges from (10 to 10 atoms/cm). The detection limit of this method depends on the blank value or counting rate limit, which varies with different instruments. 1.5 This standard The test method is a supplement to the following test methods: 1.5.1 Total reflection X-ray fluorescence spectrometer (TXRF), which can detect metals with high atomic number Z on the surface, such as Fe, but there is no enough low-level for Na, Al, and K Detection limit (). 1.5.2 Carry out vapor phase decomposition (VPD) to the metal on the surface, then use atomic absorption spectrometer (AAS) or inductively coupled plasma mass spectrometer (ICP-MS) to test the product after decomposition, the detection limit of metal It is (10-10 ) atoms/cm. However, this method cannot provide spatial distribution information, and the gas phase decomposition and pre-concentration of metals are related to the chemical characteristics of each metal.

GB/T 24575-2009 Referenced Document

• ASTM E122 Standard Practice for Calculating Sample Size to Estimate, With a Specified Tolerable Error, the Average for Characteristic of a Lot or Process
• ASTM E673 Standard Terminology Relating to Surface Analysis

GB/T 24575-2009 history

• 2009 GB/T 24575-2009 Test method for measuring surface sodium, aluminum, potassium, and iron on silicon and epi substrates by secondary ion mass spectrometry