GJB 6259-2008
Specification for self-adhesive polishing pad used for polishing of Te-Cd-Hg crysal wafer (English Version)

Standard No.

GJB 6259-2008

Language

Chinese, Available in English version

Release Date

2008

Published By

Military Standard of the People's Republic of China-Commission of Science,Technology and Industry for National Defence

Latest

GJB 6259-2008

Scope

This specification specifies the requirements, quality assurance regulations and delivery preparations for direct-bonding polishing cloths for mercury cadmium telluride detector wafers. This specification applies to direct-adhesive polishing cloths for fine polishing of HgCdTe detector wafers (hereinafter referred to as polishing cloths).

GJB 6259-2008 Referenced Document

• GB/T 13022-1991 Plastics--Determination of tensile properties of films
• GB/T 2411-1980 Plastics--Shore hardness test
• GB/T 2792-1998 Test method for peel strength of pressure-sensitive tape at 180° angle
• GB/T 2918-1998 Plastics--Standard atmospheres for conditioning and testing
• QB/T 3812.4-1999 Leather.Physical testing.Measurement of thickness

GJB 6259-2008 history

• 2008 GJB 6259-2008 Specification for self-adhesive polishing pad used for polishing of Te-Cd-Hg crysal wafer