ASTM F1238-95(2003)
Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications

Standard No.

ASTM F1238-95(2003)

Release Date

1995

Published By

American Society for Testing and Materials (ASTM)

Status

Be replaced

Replace By

ASTM F1238-95(2011)

Latest

ASTM F1238-95(2011)

Scope

1.1 This specification covers sputtering targets fabricated from metallic silicides (molybdenum silicide, tantalum silicide, titanium silicide, and tungsten silicide). These targets are referred to as refractory silicide targets, and are intended for use in microelectronic applications.

1.2 The values stated in SI units are regarded as standard.

ASTM F1238-95(2003) history

• 1995 ASTM F1238-95(2011) Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications
• 1995 ASTM F1238-95(2003) Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications
• 1995 ASTM F1238-95(1999) Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications