ASTM F1188-00
Standard Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption

Standard No.

ASTM F1188-00

Release Date

2000

Published By

American Society for Testing and Materials (ASTM)

Status

Be replaced

Replace By

ASTM F1188-02

Latest

ASTM F1188-02

Scope

1.1 This test method covers the determination of the interstitial oxygen content of single crystal silicon by infrared spectroscopy. This test method requires the use of an oxygen-free reference specimen and a set of calibration standards, such as those comprising NIST SRM 2551. It permits, but does not require, the use of a computerized spectrophotometer.

1.2 The useful range of oxygen concentration measurable by this test method is from 1 X 10¹⁶ atoms/cm³ to the maximum amount of interstitial oxygen soluble in silicon.

1.3 The oxygen concentration obtained using this test method assumes a linear relationship between the interstitial oxygen concentration and the absorption coefficient of the 1107 cm^-1 band associated with interstitial oxygen in silicon.

1.4 This standard does not purport to address all of the safety problems, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

ASTM F1188-00 Referenced Document

• ASTM E1 Standard Specification for ASTM Thermometers
• ASTM E131 Standard Definitions of Terms and Symbols Relating to Molecular Spectroscopy
• ASTM E932 Standard Practice for Describing and Measuring Performance of Dispersive Infrared Spectrometers

ASTM F1188-00 history

• 1970 ASTM F1188-02
• 2000 ASTM F1188-00 Standard Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption