DIN 50453-3:2001
Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 3: Aluminium, gravimetric method

Standard No.
DIN 50453-3:2001
Release Date
2001
Published By
German Institute for Standardization
Status
Latest
DIN 50453-3:2001
Scope
The document specifies the test method for the determination of etch rates of etch mixtures at alumnium substrates. It supplements the chemical analysis which is more expensive and does not give information on etch characteristics of the etch mixtures.

DIN 50453-3:2001 history

  • 2001 DIN 50453-3:2001 Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 3: Aluminium, gravimetric method
Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 3: Aluminium, gravimetric method



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