DIN 50453-3:2001 Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 3: Aluminium, gravimetric method
The document specifies the test method for the determination of etch rates of etch mixtures at alumnium substrates. It supplements the chemical analysis which is more expensive and does not give information on etch characteristics of the etch mixtures.
DIN 50453-3:2001 history
2001DIN 50453-3:2001 Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 3: Aluminium, gravimetric method