GB/T 17169-1997
Test method for the surface quality of polished silicon wafers and epitaxial wafers by optical-reflection (English Version)

Standard No.

GB/T 17169-1997

Language

Chinese, Available in English version

Release Date

1997

Published By

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China

Status

Withdraw

Latest

GB/T 17169-1997

Scope

This standard specifies the light reflection non-destructive inspection method for common defects on the surface of semiconductor silicon polished wafers and epitaxial wafers. This standard applies to the non-destructive inspection of the surface quality of semiconductor silicon polished wafers and epitaxial wafers. The test results of this standard are consistent with those of GB/T6624 and GB/T14142.

GB/T 17169-1997 history

• 1997 GB/T 17169-1997 Test method for the surface quality of polished silicon wafers and epitaxial wafers by optical-reflection