T/CNIA 0175-2022 Sampling method for gaseous pollutants in hydrogen-containing exhaust gas from stationary pollution sources in polycrystalline silicon production (English Version)
This document specifies the sampling method for gaseous pollutants in hydrogen-containing discharge outlets of elution towers and other stationary pollution sources in polysilicon production. This document is applicable to the sampling of gaseous pollutants in hydrogen-containing emissions from elution towers and other stationary pollution sources in polysilicon production.
T/CNIA 0175-2022 history
2022T/CNIA 0175-2022 Sampling method for gaseous pollutants in hydrogen-containing exhaust gas from stationary pollution sources in polycrystalline silicon production