DIN EN 62047-16:2015-12
Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films - Wafer curvature and cantilever beam deflection methods (IEC 62047-16:2015); German version EN 62047-16:2015

Standard No.

DIN EN 62047-16:2015-12

Release Date

2015

Published By

German Institute for Standardization

Latest

DIN EN 62047-16:2015-12

DIN EN 62047-16:2015-12 history

• 2015 DIN EN 62047-16:2015-12 Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films - Wafer curvature and cantilever beam deflection methods (IEC 62047-16:2015); German version EN 62047-16:2015
• 1970 DIN EN 62047-16 E:2012-11