What is ISO 21466 - CDSEM about ?
ISO 21466 specifies the structure model with related parameters, file format, and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimens, such as gate on wafer, photomask, single isolated or dense line feature pattern down to the size of 10 nm.
Who is ISO 21466 - CDSEM for ?
ISO 21466 on method for evaluating critical dimensions by CDSEM is useful for:
Manufacturers of ...
BS ISO 21466:2019 history
2019BS ISO 21466:2019 Microbeam analysis. Scanning electron microscopy. Method for evaluating critical dimensions by CDSEM