This standard specifies the test method for measuring impurity elements in polysilicon by glow discharge mass spectrometry (GD-MS). This standard applies to the determination of other impurity elements in polysilicon materials except hydrogen and inert gas elements. The measurement range is from the detection limit of this method to 0.1% (mass fraction). The detection limit is determined according to the instrument and measurement conditions used. With proper standard sample calibration, the content of impurity elements with a mass fraction greater than 0.1% can also be measured. Trace impurity elements in single crystal silicon materials can also be measured with reference to this standard.
GB/T 33236-2016 Referenced Document
GB/T 6682 Water for analytical laboratory use.Specification and test methods
ISO/TS 15338:2009 Surface chemical analysis - Glow discharge mass spectrometry (GD-MS) - Introduction to use
GB/T 33236-2016 history
2016GB/T 33236-2016 Polycrystalline silicon—Determination of trace elements—Glow discharge mass spectrometry method