GB/T 40110-2021
Surface chemical analysis—Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy (English Version)
- Standard No.
- GB/T 40110-2021
- Language
- Chinese, Available in English version
- Release Date
- 2021
- Published By
- 国家市场监督管理总局、中国国家标准化管理委员会
- Latest
- GB/T 40110-2021
- Scope
- This document describes the TXRF method for measuring the atomic surface density of surface element contamination on chemically mechanically polished or epitaxially grown silicon wafers. This document applies to the following situations: ——- Elements with atomic numbers from 16 (S) to 92 (U); ——— Contaminating elements with atomic surface densities between 1×1010a/cm2 and 1×1014a/cm2; tomstoms ———Polluting elements with an atomic surface density between 5×108a/cm2 and 5×1012atomst/cm2 obtained by the VPD (vapor phase decomposition) sample preparation method (see 3.oms4).
GB/T 40110-2021 Referenced Document
- ISO 14644-1 Cleanrooms and associated controlled environments - Part 1: Classification of air cleanliness by particle concentration (includes Redline Version)
GB/T 40110-2021 history
- 2021 GB/T 40110-2021 Surface chemical analysis—Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
