This standard specifies the inductively coupled plasma mass spectrometry method for the determination of impurities (boron, phosphorus, iron, calcium, aluminum, chromium, nickel, copper, zinc, titanium, potassium, sodium) in chlorosilanes for polycrystalline silicon. This standard is applicable to the determination of impurity (boron, phosphorus, iron, calcium, aluminum, chromium, nickel, copper, zinc, titanium, potassium, sodium) content in chlorosilanes for polycrystalline silicon. The measurement range is 0 μg/L ~ 1000 μg/L.
T/CNIA 0017-2019 history
2019T/CNIA 0017-2019 Determination of Impurity Content in Chlorosilanes for Polysilicon by Inductively Coupled Plasma Mass Spectrometry