T/CNIA 0118-2021 Determination of trace impurity elements in high-purity hydrofluoric acid for the electronics industry by inductively coupled plasma mass spectrometry (English Version)
This document specifies the determination of impurity elements (aluminum, antimony, arsenic, barium, boron, cadmium, calcium, chromium, copper, iron, lead, lithium, magnesium, manganese, nickel) in high-purity hydrofluoric acid used in the electronics industry by inductively coupled plasma mass spectrometry. , potassium, sodium, tin, titanium, vanadium, zinc) content method. This document is suitable for the determination of trace impurity element content in high-purity hydrofluoric acid used in the electronics industry. The measurement range is 0.001μg/kg~10.000μg/kg. The standard working curve method is applicable to the content of each trace impurity element > 0.100 μg/kg; the standard addition method is applicable to the content of each trace impurity element ≤ 0.100 μg/kg.
T/CNIA 0118-2021 history
2021T/CNIA 0118-2021 Determination of trace impurity elements in high-purity hydrofluoric acid for the electronics industry by inductively coupled plasma mass spectrometry