DIN 50453-2:2023-08
Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 2: Silicon-dioxide coating, optical method
- Standard No.
- DIN 50453-2:2023-08
- Release Date
- 2023
- Published By
- German Institute for Standardization
- Latest
- DIN 50453-2:2023-08
DIN 50453-2:2023-08 history
- 2023 DIN 50453-2:2023-08 Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 2: Silicon-dioxide coating, optical method
- 2023 DIN 50453-2:2023-02 Graphical layout and documentation of wells and ground water measuring points / Note: This standard is part of the DVGW body of rules.
- 1990 DIN 50453-2:1990 Testing of materials for semiconductor technology; determination of etch rates of etching mixtures; silicium-dioxid coating; optical method
