T/CNIA 0120-2021 Determination of trace impurity elements in high-purity nitric acid for the electronics industry by inductively coupled plasma mass spectrometry (English Version)
This document specifies the determination of impurity element content (aluminum, antimony, arsenic, barium, boron, cadmium, calcium, chromium, copper, iron, lead, lithium, magnesium, manganese, etc.) in high-purity nitric acid used in the electronics industry by inductively coupled plasma mass spectrometry. Nickel, potassium, sodium, tin, titanium, vanadium, zinc) method. This document is suitable for the determination of trace impurity element content in high-purity nitric acid used in the electronics industry. The measurement range of each element is 0.001μg/kg~10.000μg/kg. The standard working curve method is suitable for impurity element content >0.100μg/kg~10.000μg/kg; the standard addition method is suitable for impurity element content ≤0.100μg/kg~0.001μg/kg.
T/CNIA 0120-2021 history
2021T/CNIA 0120-2021 Determination of trace impurity elements in high-purity nitric acid for the electronics industry by inductively coupled plasma mass spectrometry