T/CNIA 0061-2020 Determination of Impurity Content in Silicon Tetrachloride for Silicon Epitaxy by Inductively Coupled Plasma Mass Spectrometry (English Version)
This standard specifies the use of inductively coupled plasma mass spectrometry (ICP-MS) for the determination of boron, sodium, magnesium, aluminum, potassium, calcium, phosphorus, titanium, vanadium, chromium, manganese, iron, Methods for elemental content of cobalt, nickel, copper, zinc, gallium, arsenic and lead. This standard applies to boron, sodium, magnesium, aluminum, potassium, calcium, phosphorus, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, gallium, arsenic and lead in silicon tetrachloride for silicon epitaxy Determination of content. The lower limit of determination of each element is 0.01ng/g.
T/CNIA 0061-2020 history
2020T/CNIA 0061-2020 Determination of Impurity Content in Silicon Tetrachloride for Silicon Epitaxy by Inductively Coupled Plasma Mass Spectrometry