DB53/T 501-2013
Inductively Coupled Plasma Mass Spectrometry for Determination of Trichlorosilane Impurity Element Content in Polysilicon (English Version)

Standard No.

DB53/T 501-2013

Language

Chinese, Available in English version

Release Date

2013

Published By

Yunnan Provincial Standard of the People's Republic of China

Latest

DB53/T 501-2013

Scope

This standard specifies a method for determining the content of boron, iron, aluminum, calcium, copper, chromium, nickel, antimony, cobalt, zinc, tin, titanium and manganese impurity elements in trichlorosilane for polycrystalline silicon by inductively coupled plasma mass spectrometry. This standard is applicable to the determination of the impurity element contents of boron, iron, aluminum, calcium, copper, chromium, nickel, antimony, cobalt, zinc, tin, titanium and manganese in trichlorosilane used for the production of polycrystalline silicon by the modified Siemens method.

DB53/T 501-2013 history

• 2013 DB53/T 501-2013 Inductively Coupled Plasma Mass Spectrometry for Determination of Trichlorosilane Impurity Element Content in Polysilicon