GB/T 15076.6-2020 Methods for chemical analysis of tantalum and niobium—Part 6:Determination of silicon content—Inductively coupled plasma atomic emission spectrometry (English Version)
This part of GB/T15076 specifies the determination of silicon content in tantalum and niobium by inductively coupled plasma atomic emission spectrometry. This section applies to the determination of silicon content in tantalum, niobium and their hydroxides, oxides, carbides and potassium fluorotantalate. Measuring range: 0.0005%~0.50%. 2 principle
GB/T 15076.6-2020 history
2020GB/T 15076.6-2020 Methods for chemical analysis of tantalum and niobium—Part 6:Determination of silicon content—Inductively coupled plasma atomic emission spectrometry
1994GB/T 15076.6-1994 Methods for chemical analysis of tantalum and niobium-Determination of silicon content in tantalum