This document specifies the analytical method for measuring the layer structure of multi-layer metal thin films using X-ray photoelectron spectroscopy (XPS) depth profiling. This document is suitable for the characterization of the composition, chemical state, and film thickness of nanoscale multilayer metal films within a depth of 70nm~240nm.
T/CSTM 01199-2024 history
2024T/CSTM 01199-2024 Multilayer metal film-Measurement and analysis method of layer structure-X-ray photoelectron spectroscopy