This standard is applicable to the measurement of the thickness of epitaxial layers of the same type as the substrate. The room temperature resistivity of the substrate and epitaxial layer should be less than 0.02Ω·cm and greater than 0.1Ω·cm respectively, and the measurable thickness is greater than 2μm.
SJ 2758-1987 history
1987SJ 2758-1987 Method of measurement by infrared interference for thickness of homoepitaxial layers