SJ/T 10627-1995
Test methods for oxygen precipitation characterization of silicon wafers by measurement of interstitial oxygen reduction (English Version)

Standard No.
SJ/T 10627-1995
Language
Chinese, Available in English version
Release Date
1995
Published By
Professional Standard - Electron
Status
 2010-02
Latest
SJ/T 10627-1995
Scope
This standard applies to room temperature resistivity greater than 0.1Ω. cm N-type or P-type Czochralski silicon wafer, its thermal cycle can be single temperature or dual temperature.

SJ/T 10627-1995 history

  • 1995 SJ/T 10627-1995 Test methods for oxygen precipitation characterization of silicon wafers by measurement of interstitial oxygen reduction
Test methods for oxygen precipitation characterization of silicon wafers by measurement of interstitial oxygen reduction



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