GB/T 40279-2021
Test method for thickness of films on silicon wafer surface—Optical reflection method (English Version)
- Standard No.
- GB/T 40279-2021
- Language
- Chinese, Available in English version
- Release Date
- 2021
- Published By
- 国家市场监督管理总局、中国国家标准化管理委员会
- Latest
- GB/T 40279-2021
- Scope
- This document specifies the method for measuring the thickness of silicon dioxide film and polysilicon film on the surface of silicon wafer by optical reflection method. This document is suitable for testing the thickness of silicon dioxide shallow film and polysilicon film grown on the surface of silicon wafer, and also for all smooth, transparent or translucent films with low absorption coefficient, such as amorphous silicon, Silicon nitride, diamond-like coating, photoresist and other surface films. The test range is 15 nm to 105 nm.
GB/T 40279-2021 Referenced Document
- GB/T 14264 Semiconductor materials-Terms and definitions
GB/T 40279-2021 history
- 2021 GB/T 40279-2021 Test method for thickness of films on silicon wafer surface—Optical reflection method
